Tetrafluoromethane (CF4) is a plasma etching gas widely used in the microelectronics industry. It is widely used in the etching of silicon, silicon dioxide, silicon nitride and phosphosilicon glass. It is also widely used in surface cleaning of electronic devices, production of solar cells, laser technology, low temperature refrigeration, gas insulation, leakage detection agent, attitude control of space rocket, stain remover, lubricant and brake fluid in printed circuit production. Because of its strong chemical stability, CF4 can also be used in metal smelting and plastics industry. Nowadays, the characteristics and development trend of electronic gases used in VLSI are ultra-pure, ultra-clean and multi-variety and multi-scale. In order to promote the development of microelectronic industry, countries pay more and more attention to the development of special electronic gas production technology. CF4 has long occupied the etching gas market with its relatively low price, so it has broad development potential
Sulfur hexafluoride is a colorless, odorless, non-toxic and non-corrosive compound. At normal temperature, it is gaseous and non-flammable gas, and it is a non-metallic oxide with good chemical stability. Due to its excellent chemical and thermal stability, it will not be decomposed at 500℃ under the condition of ensuring purity. Because of its excellent insulation performance and arc reduction ability, even in the arc instantaneous decomposition, ionization, but also can be quickly restored to the original stable state after arc reduction, so the use of its high chemical stability and excellent electrical insulation characteristics, widely used with the electrical industry and ultra-high voltage insulation materials. In addition, it has the characteristics of large heat transfer coefficient and good cooling effect.